For English audience
Our ERDF Project deals with ion implantation machinery what is going to become extremely cheap flexible for transformation, mini-size and lightweight - just the breakthrough in the industry.
Why such innovative apparatus is needed - because Word Statistics show that hardly over 3/4 of profit in the implantation industry comes from small R&D innovation companies, what logically have no enough resources to buy own multi-million costs implater. Thus they are using implantation as outsourced service but it costs head-spinning high and technical brake percentage may be woeful.
Our offered solution to this problem is boron dopant ion source utilizing the clean boron powder instead of heavyweight and extreme poisonous fluorides gas bottles hold, and excitation with Hollow Cathode with pre-heating were following an inductively coupled plasma cascade to alter the ionization degree. Most of vacuum bundles may be made from quartz-glass thus making it cheaper, handling about order higher vacuum as best metals give a chance, and easy to change if modifications are needed.
For purification is used the Quadrupole (radiofrequency electrostatic) mass filter instead of massive elektromagnetic one, that gives as well the filtering factor improvement, as diminishes price and weight. For ion beam forming are used classical electrostatical DC Einzel lens, as well for final acceleration up to 100 kV. For beam scanning are used at x and y coordinates fixeed 2 kV declining (sccanning) electrodes. The sample holder is fixed in AISI metal chamber, as well the QMS filter. Between glass and metal parts are used indium base tighteners.